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26 积分 2023-10-13 加入
Plasma etching of high aspect ratio features in SiO2 using Ar/C4F8/O2 mixtures: A computational investigation
26天前
已完结
Infinite selectivity in dry etching process for high-aspect-ratio hole using C7HF7 gas plasma
27天前
已完结
Challenges in high-aspect ratio contact (HARC) etching for DRAM capacitor formation
27天前
已完结
Directed self-assembly of medium-chi and high-chi block copolymers for DRAM C/H patterning
27天前
已完结
Modeling and control of L-type network impedance matching for semiconductor plasma etch
1个月前
已关闭
Advancements in High-Aspect Ratio Container Etch Systematic Edge Yield in 1β DRAM Devices
2个月前
已完结
High Aspect Ratio Carbon Hard Mask Etch Process for Profile and LCDU Control
2个月前
已完结
LCDU enhancement of 2D layout through curvilinear solutions for DRAM DUV critical layers
2个月前
已完结
Contact local CD uniformity optimization through etch shrink
2个月前
已完结
Atom-Scale Tunneling
7个月前
已关闭
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