| 标题 |
Modeling and control of L-type network impedance matching for semiconductor plasma etch |
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| DOI | |
| 其它 |
期刊:Journal of vacuum science and technology 作者:Carlos Rodriguez; Jairo Viola; YangQuan Chen; Joaquín Álvarez 出版日期:2024-03-01 |
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(2025-6-4)