Lv41
456 积分 2024-04-15 加入
Plasma etching of Si and SiO2—The effect of oxygen additions to CF4 plasmas
1小时前
已完结
Anti-oxidant copper layer by remote mode N2 plasma for low temperature copper–copper bonding
2小时前
已完结
Plasma dry desmear of Ajinomoto build-up film for fine micro-via fabrication in advanced semiconductor packaging
2小时前
已完结
Etching behavior of an epoxy film in O2/CF4 plasmas
2小时前
已完结
Mechanistic Insights into Dislocation‐Mediated Single‐Atom Doping of 2D Transition Metal Dichalcogenides
8个月前
已完结
Direct electroconversion of air to nitric acid under mild conditions
10个月前
已完结
Optoelectronic and Ionic Effects on Transport in van der Waals Metal Selenophosphate AgBiP2Se6
1年前
已完结
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