Lv41
500 积分 2020-10-24 加入
Self-aligned fin cut last patterning scheme for fin arrays of 24nm pitch and beyond
2小时前
待确认
SoC Profile Control for BEOL Tri-Layer Patterning Scheme
2个月前
已完结
Tri-Layer Mask Dry Etch Process Optimizing and Wet Effect for Straight Profile
2个月前
已完结
mCFET inner spacer cavity etch: process development and challenges
3个月前
已完结
Analysis and Optimization of Nanosheet FETs With Vertically Nonuniform Source/Drain Etch Profiles
3个月前
已完结
A Comprehensive Study of NF3-Based Selective Etching Processes: Application to the Fabrication of Vertically Stacked Horizontal Gate-All-around Si Nanosheet Transistors
3个月前
已完结
Mechanism and Effect of 4-Level RF Pulsing on Etching Process in Advanced Node
3个月前
已完结
Gate-Cut-Last in RMG to Enable Gate Extension Scaling and Parasitic Capacitance Reduction
6个月前
已完结
High-aspect-ratio amorphous carbon mask etch profile control through plasma and surface chemistry optimization
6个月前
已完结
Etching characteristics of hydrogenated amorphous carbon with different sp2/sp3 hybridization ratios in CF4/O2 plasmas
6个月前
已完结
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