Lv1
90 积分 2020-10-24 加入
Precise Inner Spacer Etch-Back By Combining Ozone Gas Bake and Wet Chemical Etching
4天前
求助中
Etch Rate Uniformity Monitoring for Photoresist Etch Using Multi-channel Optical Emission Spectroscopy and Scanning Floating Harmonic Probe in an Inductively Coupled Plasma Reactor
1个月前
已完结
Co-optimization of exposure dose and etch process for SAQP pitch walk control
1个月前
已完结
Integrated self-aligned quadruple patterning flow for sub-7nm application
1个月前
已完结
Pattern optimizing verification of self-align quadruple patterning
1个月前
已完结
Low-temperature etching of silicon oxide and silicon nitride with hydrogen fluoride
2个月前
已完结
The Effects of Poly Corner Etch Residue on Advanced Finfet Device Performance
3个月前
已完结
Mechanisms involved in HBr and Ar cure plasma treatments applied to 193 nm photoresists
4个月前
已完结
Plasma etch solutions for EUV patterning: defect challenges
7个月前
已完结
Plasma etch solutions for EUV patterning: defect challenges
7个月前
已关闭
皖公网安备34019202002308
