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50 积分 2020-10-24 加入
High-aspect-ratio amorphous carbon mask etch profile control through plasma and surface chemistry optimization
12小时前
待确认
Etching characteristics of hydrogenated amorphous carbon with different sp2/sp3 hybridization ratios in CF4/O2 plasmas
12小时前
求助中
A 38.1Mb/mm2 SRAM in a 2nm-CMOS-Nanosheet Technology for High-Density and Energy-Efficient Compute
1个月前
已完结
Advanced process technologies for continuous logic scaling towards 2nm node and beyond (Invited)
1个月前
已完结
2nm Platform Technology Featuring Energy-Efficient Nanosheet Transistors and Interconnects Co-Optimized with 3DIC for AI, HPC and Mobile SoC Applications
1个月前
已完结
Silicon RibbonFET CMOS at 6nm Gate Length
1个月前
已完结
Precise Inner Spacer Etch-Back By Combining Ozone Gas Bake and Wet Chemical Etching
2个月前
已关闭
Etch Rate Uniformity Monitoring for Photoresist Etch Using Multi-channel Optical Emission Spectroscopy and Scanning Floating Harmonic Probe in an Inductively Coupled Plasma Reactor
3个月前
已完结
Co-optimization of exposure dose and etch process for SAQP pitch walk control
4个月前
已完结
Integrated self-aligned quadruple patterning flow for sub-7nm application
4个月前
已完结
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