Lv53
1560 积分 2025-02-09 加入
Control of differential etch rates in heterogeneous poly-silicon and oxide etch environments
8天前
已完结
Selective mask deposition using SiCl4 plasma for highly selective etching process
8天前
已关闭
B4C and WC as viable alternatives to SiC for plasma-facing components in semiconductor manufacturing
15天前
已完结
B4C and WC as viable alternatives to SiC for plasma-facing components in semiconductor manufacturing
19天前
已完结
Effects of grain size and crystallographic orientation on plasma etching behavior in tungsten carbide
19天前
已完结
The 2022 Plasma Roadmap: low temperature plasma science and technology
20天前
已完结
Science challenges and research opportunities for plasma applications in microelectronics
22天前
已完结
Highly selective etching of SiNx over SiO2 using ClF3/Cl2 remote plasma
1个月前
已完结
Spontaneous etching of B2O3 by HF gas studied using infrared spectroscopy, mass spectrometry, and density functional theory
1个月前
已完结
Low-temperature etching of silicon oxide and silicon nitride with hydrogen fluoride
1个月前
已完结
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