Lv514
1290 积分 2025-02-09 加入
Understanding the contributions of F–, HF, and HF2– to the etching of SiO2 and unveiling the reaction kinetics to represent etching behavior of SiO2 up to pH 5
52分钟前
已完结
Investigation of the oxidation of plasma sprayed silicon coating
2小时前
已完结
Etching Technologies in Semiconductor Manufacturing: A Short Review
21天前
已完结
Physical Mechanisms in Plasma Spray Processing of Suspensions
1个月前
已完结
Effect of controlling residual moisture in atmospheric plasma spray-Y2O3 coatings on random defect generation by halogen-based plasma
2个月前
已完结
Atomic-Scale Etching Mechanism of Aluminum with Fluorine-Based Plasma
2个月前
已完结
Model analysis of the feature profile evolution during Si etching in HBr-containing plasmas
2个月前
已完结
Stability of CD off-target: analysis
3个月前
已完结
Novel and Practical Fabrication of Pre-seasoned Y2O3 Ceramics Through Surface Modification
3个月前
已完结
Sputtering thin films: Materials, applications, challenges and future directions
3个月前
已完结
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