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746 积分 2023-10-22 加入
Extreme Ultraviolet and Beyond Extreme Ultraviolet Lithography using Amorphous Zeolitic Imidazolate Resists Deposited by Atomic/Molecular Layer Deposition
1小时前
已完结
Trends in photoresist materials for extreme ultraviolet lithography: A review
1小时前
已完结
Extreme ultraviolet lithography
1小时前
已完结
Advancing EUV Patterning: Innovations in Resist Platforms, Patterning Strategies, and Computational Approaches
1小时前
已完结
Vapor-Phase Dry Development of a Nanoscale Zn-Based Metal–Organic Extreme Ultraviolet Photoresist via Surface-Limited β-Diketone Chelation for High-Resolution Patterning
1小时前
已完结
Imido-Based Non-Ionic Photoacid Generators Targeted for Double Amplification EUV Resists
1小时前
待确认
157-nm pellicles for photolithography: mechanistic investigation of the deep-UV photolysis of fluorocarbons
1天前
已完结
Nanocomposite approaches toward pellicles for 157-nm lithography
4天前
已完结
Polymers Based on a Novel 1,3-perfluorodioxole for Use as a Soft Polymer Pellicle in 157nm Lithography
4天前
已完结
Development of the pellicle for KrF excimer laser photolithography
4天前
已完结
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