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18 积分 2024-04-09 加入
Isotropic plasma-thermal atomic layer etching of superconducting titanium nitride films using sequential exposures of molecular oxygen and SF6/H2 plasma
2天前
已完结
Scatterometry and AFM measurement combination for area selective deposition process characterization
2个月前
已完结
Thin film deposition of Ta, TaN and Ta/TaN bi-layer on Ti and SS316-LVM substrates by RF sputtering
5个月前
已完结
Fabrication of Ta/TaN diffusion-barrier thin films using DC magnetron sputtering
5个月前
已完结
Chip fabrication from electrochemical perspective: challenges and opportunities
6个月前
已完结
Atomic Structure and Optical Properties of Plasma Enhanced Chemical Vapor Deposited SiCOH Low-k Dielectric Film
8个月前
已完结
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