Lv2
154 积分 2022-07-25 加入
Kinetics model for thermal selective etching of Si1−xGex in F2/Ar
5小时前
已完结
Multiple-step Siconi pre-clean advantages for Ni(Pt)Si film formation in the frame of advanced FDSOI technology development
6天前
已完结
Growth kinetics of Si and SiGe on Si(100), Si(110) and Si(111) surfaces
1个月前
已完结
Anisotropic vapor HF etching of silicon dioxide for Si microstructure release
2个月前
已完结
Selective etching mechanism of silicon oxide against silicon by hydrogen fluoride: a density functional theory study
2个月前
已完结
Structural Defects of Silicon Epitaxy and Epi/Substrate Interface Related to Improper In-Situ Surface Cleaning at Low Temperatures
2个月前
已关闭
Recent Advances in Plasma Etching for Micro and Nano Fabrications of Silicon-based Materials: A Review
2个月前
已完结
Dry Etching Technology for Semiconductors
2个月前
已完结
Low-temperature etching of silicon oxide and silicon nitride with hydrogen fluoride
2个月前
已完结
Study of CF4, C2F6, SF6 and NF3 Decomposition Characteristics and Etching Performance in Plasma State
3个月前
已完结
皖公网安备34019202002308
