Lv4
460 积分 2023-02-27 加入
Diaryl Telluroxides as Reversible Recognition Arrays in Solution
21天前
已完结
Enabling new resist systems to get the most out of EUV tools with novel approaches
24天前
已关闭
Multi-Trigger Resist for EUV lithography
24天前
已完结
Introduction of selenium and tellurium into reaction systems
2个月前
已完结
Novel 193-nm photoresist based on Olefin-containing lactones
3个月前
已完结
Intramolecular Hydrogen Bonding Enables 5.9% External Quantum Efficiency in Radical-Based Near-Infrared Organic Light-Emitting Diodes with Emission beyond 850 nm
3个月前
已完结
High-Performance Chain Scissionable Resists for Extreme Ultraviolet Lithography: Discovery of the Photoacid Generator Structure and Mechanism
3个月前
已完结
Synthesis of End-Cap Enabled Self-Immolative Photoresists For Extreme Ultraviolet Lithography
3个月前
已完结
Extreme Ultraviolet Lithographic Performance and Reaction Mechanism of Polymeric Resist─Utilizing Radical- and Acid-Amplified Cross-Linking
3个月前
已完结
Trends in photoresist materials for extreme ultraviolet lithography: A review
3个月前
已完结
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