Lv4
584 积分 2023-02-27 加入
Introduction of selenium and tellurium into reaction systems
10天前
已完结
Novel 193-nm photoresist based on Olefin-containing lactones
17天前
已完结
Intramolecular Hydrogen Bonding Enables 5.9% External Quantum Efficiency in Radical-Based Near-Infrared Organic Light-Emitting Diodes with Emission beyond 850 nm
20天前
已完结
High-Performance Chain Scissionable Resists for Extreme Ultraviolet Lithography: Discovery of the Photoacid Generator Structure and Mechanism
1个月前
已完结
Synthesis of End-Cap Enabled Self-Immolative Photoresists For Extreme Ultraviolet Lithography
1个月前
已完结
Extreme Ultraviolet Lithographic Performance and Reaction Mechanism of Polymeric Resist─Utilizing Radical- and Acid-Amplified Cross-Linking
1个月前
已完结
Trends in photoresist materials for extreme ultraviolet lithography: A review
1个月前
已完结
Performance Optimization of Sulfonium-Functionalized Molecular Resists for EUV and Electron Beam Lithography
1个月前
已完结
A study on the resist performance of inorganic-organic resist materials for EUV and electron-beam lithography
1个月前
已完结
Physics of Semiconductor Devices
1个月前
已完结
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