Lv4
528 积分 2026-08-19 加入
Effects of acid diffusion and resist molecular size on line edge roughness for chemically amplified resists in EUV lithography: computational study
6小时前
已完结
Stochastic simulation of pattern formation for chemically amplified resist in electron beam lithography
7小时前
已关闭
Stochastic simulation of pattern formation for chemically amplified resist in electron beam lithography
7小时前
已关闭
Role of counter-anion chemistry, free volume, and reaction byproducts in chemically amplified resists
8小时前
已完结