| 标题 |
Stochastic simulation of pattern formation for chemically amplified resist in electron beam lithography |
| 网址 | |
| DOI |
10.7567/1347-4065/ab0acd.doi:10.7567/1347-4065/ab0acd
doi
|
| 其它 |
期刊:Japanese Journal of Applied Physics 作者:Masanori Koyama; Masamitsu Shirai; Hiroaki Kawata; Yoshihiko Hirai; Masaaki Yasuda 出版日期:2019 |
| 求助人 | |
| 下载 |
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(2025-6-4)