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2180 积分 2024-01-20 加入
Analysis of plasma etching resistance for commercial quartz glasses used in semiconductor apparatus in fluorocarbon plasma
1小时前
已完结
Plasma resistant glass (PRG) for reducing particulate contamination during plasma etching in semiconductor manufacturing: A review
3天前
已完结
Mechanism and solution of sharp defects in trench double-diffused metal-oxide semiconductor polysilicon recess etching
4个月前
已完结
Mechanism of Surface Charging Effects on Etching Profile Defects
4个月前
已完结
Etch Defect Reduction Using SF6/O2 Plasma Cleaning and Optimizing Etching Recipe in Photo Resist Masked Gate Poly Silicon Etch Process
6个月前
已完结
Instantaneous generation of many flaked particles caused by micro-arc discharge and detection method using load impedance monitoring system — Yuji Kasashima
7个月前
已完结
Lithography PR profile improvement and defects reduction by film pre-treatment
7个月前
已完结
The Mechanism of an Etching-Back to Reduce the Density of Cone Defect in STI During the Manufacturing
8个月前
已完结
Thermal and Electrical Analysis of the Electrostatic Chuck for the Etch Equipment
8个月前
已完结
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