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100 积分 2025-09-29 加入
Modeling the charging effect of the hardmask and silicon substrate during plasma etching in advanced nodes
12天前
已关闭
Selective molecular gas phase etching in layered high aspect-ratio nanostructures for semiconductor processing. I. Modeling framework and simulation
28天前
已完结
Selective molecular gas phase etching in layered high aspect-ratio nanostructures for semiconductor processing. II. Experiments and model validation
28天前
已完结
Review of virtual wafer process modeling and metrology for advanced technology development
1个月前
已完结
Embracing SemiverseTM Solutions: Semiconductor Virtual Fabrication and Its Applications
1个月前
已完结
Surface damage formation during atomic layer etching of silicon with chlorine adsorption
1个月前
已关闭
Atomistic insights into ion irradiation effects in plasma-enhanced atomic layer deposition of silicon nitride
1个月前
已完结
Dynamic evolution of surface charge on dielectric materials
2个月前
已完结
Charging Issues on the Rectangle Mask Line During Plasma Etching with Consideration of Electron-Solid Interaction
2个月前
已完结
The Influence of Secondary Electron Emission on Surface Charging on a Mask Trench in Plasma Etching
2个月前
已完结
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