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100 积分 2025-09-29 加入
A First-Principles Mechanistic Study of Thermal Selective Etching of SiGe and Si with Fluorine-Containing Etchants
1个月前
已完结
Modeling the charging effect of the hardmask and silicon substrate during plasma etching in advanced nodes
2个月前
已关闭
Selective molecular gas phase etching in layered high aspect-ratio nanostructures for semiconductor processing. I. Modeling framework and simulation
2个月前
已完结
Selective molecular gas phase etching in layered high aspect-ratio nanostructures for semiconductor processing. II. Experiments and model validation
2个月前
已完结
Review of virtual wafer process modeling and metrology for advanced technology development
2个月前
已完结
Embracing SemiverseTM Solutions: Semiconductor Virtual Fabrication and Its Applications
2个月前
已完结
Surface damage formation during atomic layer etching of silicon with chlorine adsorption
3个月前
已关闭
Atomistic insights into ion irradiation effects in plasma-enhanced atomic layer deposition of silicon nitride
3个月前
已完结
Dynamic evolution of surface charge on dielectric materials
4个月前
已完结
Charging Issues on the Rectangle Mask Line During Plasma Etching with Consideration of Electron-Solid Interaction
4个月前
已完结
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