Lv2
120 积分 2025-09-29 加入
Surface damage formation during atomic layer etching of silicon with chlorine adsorption
3天前
已关闭
Atomistic insights into ion irradiation effects in plasma-enhanced atomic layer deposition of silicon nitride
6天前
已完结
Dynamic evolution of surface charge on dielectric materials
1个月前
已完结
Charging Issues on the Rectangle Mask Line During Plasma Etching with Consideration of Electron-Solid Interaction
1个月前
已完结
The Influence of Secondary Electron Emission on Surface Charging on a Mask Trench in Plasma Etching
1个月前
已完结
Diffusion-reaction modeling of atomic layer etching
1个月前
已关闭
Simulation-guided AI-driven digital twin for plasma etching in semiconductor fabrication
2个月前
已关闭
Fast and realistic 3D feature profile simulation platform for plasma etching process
3个月前
已完结
Optimization of silicon etch rate in a CF4/Ar/O2 inductively coupled plasma
3个月前
已完结
Differential ionization cross-section of hydrogen bromide
3个月前
已完结
皖公网安备34019202002308
