Lv11
70 积分 2022-10-08 加入
Dielectric barrier characteristics of Si-rich silicon nitride films deposited by plasma enhanced atomic layer deposition
48分钟前
已完结
Advances and challenges in novel non-perovskite-based ferroelectrics film for memory device applications
2个月前
已完结
Ammonium chloride (–NH3+Cl-) salt formation from dichlorosilane decomposition and its potential impact on silicon nitride atomic layer deposition
2个月前
已完结
Temperature dependency of the kinetics of PureB CVD deposition over patterned Si/SiO2 surfaces
3个月前
已完结
Rapid Thermal Annealing Process Toward Enhancement of ITO Thin Films
8个月前
已完结
Atomic layer deposition of Y2O3 as high-k dielectrics by using a heteroleptic yttrium precursor and water
10个月前
已完结
Growth of conformal TiN thin film with low resistivity and impurity via hollow cathode plasma atomic layer deposition
1年前
已完结
Degradation mechanisms for a-InGaZnO thin-film transistors functioning under simultaneous DC gate and drain biases
1年前
已完结
Role of reactive gas on the structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition
1年前
已关闭
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