Lv1
80 积分 2025-04-15 加入
Selective nitride passivation using vapor-dosed aldehyde inhibitors for area-selective atomic layer deposition
12天前
已完结
Inhibitor-free area selective atomic layer deposition of SiO2 thin films by in situ surface cleaning using isotropic SiO2 selective removal
12天前
已完结
Inhibitor-free area-selective atomic layer deposition of SiO2 through chemoselective adsorption of an aminodisilane precursor on oxide versus nitride substrates
12天前
已完结
Selective and Superconformal Molybdenum Growth Strategies for Advanced Metallization
20天前
已完结
Pyridine-Catalyzed Atomic Layer Deposition of SiO2 from Hexachlorodisilane and Water: An In Situ Mechanistic Study
22天前
已完结
Molecular Layer Deposition of a Hafnium-Based Hybrid Thin Film as an Electron Beam Resist
29天前
已完结
“Three‐Color” Chemical Selectivity between Oxide, Nitride, and Silicon: Area‐Selective Deposition of Metal Oxide and Polymer on SiN and Si‐H versus SiO 2
1个月前
已完结
Surface sulfurization of liner and ruthenium metallization to reduce interface scattering for Low-Resistance interconnect
1个月前
已完结
Interface dipole engineering via TiO2-doped HfO2 interlayers for flat-band voltage modulation in scaled high-k gate stacks
1个月前
已完结
Impact of Ultrathin TiO2 Interlayer on the Structure and Properties of All Atomic Layer Deposited TiN/Hf0.5Zr0.5O2/TiN Ferroelectric System
1个月前
已完结
皖公网安备34019202002308
