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104 积分 2025-04-15 加入
Molecular Layer Deposition of a Highly Stable Silicon Oxycarbide Thin Film Using an Organic Chlorosilane and Water
10天前
已关闭
Anti-Corrosion Properties of Tantalum-Based Composite Films Prepared by Atomic Layer Deposition
1个月前
已完结
Highly Stackable 3D DRAM of Dual-Gate IGZO 2T0C with Record 3 Bits/Cell and 400s Data Retention
1个月前
已完结
Properties of low-resistivity molybdenum metal thin film deposited by atomic layer deposition using MoO2Cl2 as precursor
1个月前
已完结
Study on the Deposition Characteristics of Molybdenum Thin Films Deposited by the Thermal Atomic Layer Deposition Method Using MoO2Cl2 as a Precursor
2个月前
已完结
Dipole formation to modulate flatband voltage using ALD Al2O3 and La2O3 at the interface between HfO2 and Si or Ge substrates
2个月前
已完结
Selective nitride passivation using vapor-dosed aldehyde inhibitors for area-selective atomic layer deposition
3个月前
已完结
Inhibitor-free area selective atomic layer deposition of SiO2 thin films by in situ surface cleaning using isotropic SiO2 selective removal
3个月前
已完结
Inhibitor-free area-selective atomic layer deposition of SiO2 through chemoselective adsorption of an aminodisilane precursor on oxide versus nitride substrates
3个月前
已完结
Selective and Superconformal Molybdenum Growth Strategies for Advanced Metallization
3个月前
已完结
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