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10 积分 2025-04-15 加入
Reaction mechanism and film properties of the atomic layer deposition of ZrO2 thin films with a heteroleptic CpZr(N(CH3)2)3 precursor
46分钟前
待确认
Influence of process parameters on atomic layer deposition of ZrO2 thin films from CpZr(NMe2)3 and H2O
52分钟前
已完结
Reaction mechanism of atomic layer deposition of zirconium oxide using tris(dimethylamino)cyclopentadienyl zirconium: experimental and theoretical study
1小时前
已完结
Blocking mechanisms in area-selective ALD by small molecule inhibitors of different sizes: Steric shielding versus chemical passivation
2天前
已完结
Improvement of Corrosion Resistance and Electrical Conductivity of Stainless Steel 316L Bipolar Plate by Pickling and Passivation
3天前
已完结
Erosion and Passivation of Borated 254 SMO Stainless Steel in Simulated Flue Gas Desulfurization Solution
3天前
已完结
Small and Simple Molecular Structure Based Thermally Stable Ruthenium Precursor in Advancing Ruthenium ALD Process for Scaled Interconnect Metallization
15天前
已完结
Theoretical Design Strategies for Area-Selective Atomic Layer Deposition
15天前
已完结
Layer-by-layer NH3 plasma treatment for area-selective atomic layer deposition of high-quality SiO2 thin films
15天前
已完结
Elucidating the surface chemistry of SiO2 and SiNx in hydrofluoric acid for area-selective atomic layer deposition of SiO2
16天前
已完结
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