Lv41
480 积分 2024-11-14 加入
半导体设备。
Fluid simulation of the superimposed dual-frequency source effect in inductively coupled discharges
2天前
已完结
Multiphysics simulation of non-uniform magnetic fields’ effect on plasma uniformity in capacitively coupled plasmas
9天前
已完结
Numerical study on the effect of electric field distribution on plasma discharge in ferromagnetic-enhanced inductively coupled plasma
17天前
已关闭
The Effects of RF Power and Cavity Structure on the Plasma Discharge Characteristics of RPS
18天前
已完结
Allen J Jr, Durham J, Schweitzer G K and Deeds W 1976 J. Electron. Spectrosc. 8 395
8个月前
已关闭
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