Lv3
380 积分 2025-03-10 加入
Selective TiSi2 Formation Using TiCl4(g), Si(s) and H2(g): A study of the Mask Loading Phenomena
15小时前
待确认
The Process Challenge and Optimization of Self-Aligned Contact Etch
16小时前
求助中
Selective TiSi2 Formation Using TiCl4(g), Si(s) and H2(g): A study of the Mask Loading Phenomena
5天前
已完结
Enhancement of performance and reliability in MOSFETs via high-pressure microwave annealing
18天前
已关闭
Exploration of High‐Pressure Annealing and Microwave Annealing in Palladium Germano‐Silicide Formation for Si0.8Ge0.2‐Based Complementary Metal‐Oxide–Semiconductor Transistors
18天前
已完结
藉由高壓退火及微波退火提升半導體汲極,源極特性之研究
18天前
已关闭
芯片制程中金属互连工艺及其相关理论研究进展
29天前
已完结
Optimization of photoresist development and DRIE processes to fabricate high aspect ratio Si structure in 5 nm scale
1个月前
已完结
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