Lv11
36 积分 2022-07-08 加入
Facile fabrication of high-resolution extreme ultraviolet interference lithography grating masks using footing strategy during electron beam writing
4小时前
已完结
Sub-10 nm patterning using EUV interference lithography
4小时前
已完结
Engineering the Future of EUV Lithography: A Collaborative Journey in Metal-Oxide Resist Innovation
2天前
已完结
Unraveling the role of photons and electrons upon their chemical interaction with photoresist during EUV exposure
30天前
已完结
Metal oxide resist formulation and process advancements towards high-NA EUV lithography
30天前
已完结
Metal oxide EUV photoresist performance for N7 relevant patterns and processes
30天前
已完结
Effect of Oxygen on Thermal and Radiation-Induced Chemistries in a Model Organotin Photoresist
1个月前
已完结
Fundamental understanding of exposure and process chemistry of Sn-based metal oxide resists: effects of ambient environment during post-exposure delay and bake
1个月前
已完结
Recent Advances in Cholesteric Liquid Crystal Elastomers: Fabrication, Functionalization, and Applications
2个月前
已完结
Dynamic Modulation of Circularly Polarized Luminescence in Cholesteric Liquid Crystal Systems: Mechanisms, Strategies, and Beyond
5个月前
已完结
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