Lv51
899 积分 2021-08-11 加入
Etching suppression of silicon nitride by ammonium fluorosilicate formation during cryogenic NF3/NH3 plasma reactive ion etching
4小时前
已完结
Formation and stability of ammonium fluorosilicate during etching of SiN x in CH2F2/Ar and SF6/H2 plasmas
2个月前
已完结
Cryogenic plasma etching for SiO2/SiN dielectric films: a mini review
2个月前
已完结
Etching suppression of silicon nitride by ammonium fluorosilicate formation during cryogenic NF3/NH3 plasma reactive ion etching
2个月前
已关闭
Role of CF4 Addition in Gas-Phase Variations in HF Plasma for Cryogenic Etching: Insights from Plasma Simulation and Experimental Correlation
4个月前
已完结
Development for high-aspect-ratio hole etching with hydrogen fluoride gas based cryogenic process
4个月前
已关闭
Investigation of surface reactions of etched SiN films using HF/PF3 gas mixture plasma under cryogenic conditions via in-line XPS: The role of ammonium salts in etch rate enhancement
4个月前
已完结
Low-temperature etching of silicon oxide and silicon nitride with hydrogen fluoride
1年前
已完结
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