Lv23
106 积分 2023-03-21 加入
Advancing EUV Patterning: Innovations in Resist Platforms, Patterning Strategies, and Computational Approaches
11天前
已完结
Hydrophilicity-Tuned Iodine-Containing Quasi-Alternating Copolymers for Extreme Ultraviolet Lithography
12天前
已完结
Direct Measurements and Analysis of Catalyst Diffusion and Reaction Fronts in Chemically Amplified Resists
12天前
已完结
Direct Measurements and Analysis of Catalyst Diffusion and Reaction Fronts in Chemically Amplified Resists
15天前
已完结
Metal-Ligand Coordination Enables Molecular Resist-Based Direct Write Lithography of Metal Halides
29天前
已完结
Revealing Structure-Driven Performance of Molecular-Atomic Layer Deposited Resists for Extreme Ultraviolet Lithography through In Situ Analysis
29天前
已完结
Tin-coordinated hybrid photoresists for dose-efficient EUV lithography
1个月前
已完结
Key Challenges and Opportunities for Advanced Extreme Ultraviolet Lithography Photoresist Materials
2个月前
已完结
Towards environmentally friendly processing of ionic liquid-based photoresists with a boosted lithography performance
2个月前
已完结
Living Anionic Polymerization of 4‐Trimethylstannylstyrene
3个月前
已完结
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