Lv3
260 积分 2023-05-10 加入
Manipulation of etch selectivity of silicon nitride over silicon dioxide to a-carbon by controlling substate temperature with a CF4/H2 plasma
10个月前
已完结
In-situ PECVD-based stoichiometric SiO2 layer for semiconductor devices
10个月前
已完结
Recess-Free E-Mode AlGaN/GaN MIS-HFET with Crystalline PEALD AlN Passivation Process
10个月前
已完结
Design of organic/inorganic multilayer water vapor barrier thin films deposited via plasma polymerization for encapsulation
10个月前
已完结
Fabrication, Characterization, and Corrosion Protection of Siloxane Coating on an Oxygen Plasma Pre-treated Silver-Copper Alloy
10个月前
已完结
Boron Carbonitride Films with Tunable Composition: LPCVD and PECVD Synthesis Using Trimethylamine Borane and Nitrogen Mixture and Characterization
10个月前
已完结
Novel technology of high-aspect-ratio etch utilizing coverage-controllable atomic layer deposition
10个月前
已完结
Review—Atomic Layer Deposition of Silicon Dioxide Thin Films
10个月前
已完结
Ultraviolet laser damage properties of single-layer SiO2 film grown by atomic layer deposition
10个月前
已完结
A Study of the properties of TiO2/SiO2/ZrO2 Thin Films Deposited by RF Magnetron Sputtering
10个月前
已完结
皖公网安备34019202002308
