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200 积分 2025-11-03 加入
Thermal Atomic Layer Etching of SiO2 by a “Conversion-Etch” Mechanism Using Sequential Reactions of Trimethylaluminum and Hydrogen Fluoride
1个月前
已完结
Enhanced atomic layer etching of native aluminum oxide for ultraviolet optical applications
1个月前
已完结
CF4 plasma-based atomic layer etching of Al2O3 and surface smoothing effect
1个月前
已完结
Etching Mechanisms and Surface Conditions for SiOxNy Thin Films in CF4 + CHF3 + O2 Inductively Coupled Plasma
2个月前
已完结
High-etch-rate type 248-nm bottom antireflective coatings
3个月前
已完结
High-etch-rate type 248-nm bottom antireflective coatings
3个月前
已关闭
Dynamics of collisionless rf plasma sheaths
4个月前
已完结
Novel gap filling technique of shallow trench isolation structure in 16/14 nm FinFET using sub-atmospheric chemical vapor deposition
4个月前
已关闭
Modeling and Control of SiNx Film Growth using the Kinetic Monte Carlo Method: Impact of Gas Flow Rate on Surface Roughness and Film Thickness
4个月前
已完结
Study on the etching mechanism of quartz using dual-frequency (60 MHz/400 KHz) capacitively coupled C4F8/Ar/O2 plasma
5个月前
已完结
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