Lv31
370 积分 2025-11-03 加入
Characterization of Plasma‐Deposited Silicon Dioxide
1个月前
已完结
The step coverage of undoped and phosphorus‐doped SiO2 glass films
1个月前
已完结
In-depth study of silicon-oxide thin films: Effect of N2O/SiH4 gas mixture
1个月前
已完结
Monte Carlo simulation of surface kinetics during plasma enhanced chemical vapor deposition of SiO2 using oxygen/tetraethoxysilane chemistry
1个月前
已完结
Profile evolution simulator for sputtering and ion-enhanced chemical etching
4个月前
已完结
Thermal Atomic Layer Etching of SiO2 by a “Conversion-Etch” Mechanism Using Sequential Reactions of Trimethylaluminum and Hydrogen Fluoride
5个月前
已完结
Enhanced atomic layer etching of native aluminum oxide for ultraviolet optical applications
5个月前
已完结
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