Lv32
240 积分 2025-11-03 加入
In-depth study of silicon-oxide thin films: Effect of N2O/SiH4 gas mixture
4天前
已完结
Monte Carlo simulation of surface kinetics during plasma enhanced chemical vapor deposition of SiO2 using oxygen/tetraethoxysilane chemistry
12天前
已完结
Profile evolution simulator for sputtering and ion-enhanced chemical etching
2个月前
已完结
Thermal Atomic Layer Etching of SiO2 by a “Conversion-Etch” Mechanism Using Sequential Reactions of Trimethylaluminum and Hydrogen Fluoride
4个月前
已完结
Enhanced atomic layer etching of native aluminum oxide for ultraviolet optical applications
4个月前
已完结
CF4 plasma-based atomic layer etching of Al2O3 and surface smoothing effect
4个月前
已完结
Etching Mechanisms and Surface Conditions for SiOxNy Thin Films in CF4 + CHF3 + O2 Inductively Coupled Plasma
5个月前
已完结
High-etch-rate type 248-nm bottom antireflective coatings
6个月前
已完结
High-etch-rate type 248-nm bottom antireflective coatings
6个月前
已关闭
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