| 标题 |
 Effect of the Ion Flux Incident on the Wafer Depending on the Structure and Material of the Focus Ring in Capacitively Coupled Plasma Sources for the Semiconductor Etching Process |
| 网址 | |
| DOI |
10.3938/npsm.74.401
doi
|
| 其它 |
期刊：New Physics: Sae Mulli 作者：Cheongbin Cheon; Hae June Lee 出版日期：2024-04-30 |
| 求助人 | |
| 下载 | 求助已完成，仅限求助人下载。 |
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