| 标题 |
 Band offsets at amorphous hydrogenated boron nitride/high-k oxide interfaces from x-ray photoelectron spectroscopy with charging effects analysis |
| 网址 | |
| DOI | |
| 其它 |
期刊：Journal of Vacuum Science & Technology. B. Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena 作者：M. Paquette; A. Caruso; J. Brockman; J. Bielefeld; M. Kuhn; et al 出版日期：2020-04-09 |
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(2025-6-4)
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