| 标题 |
Diamondlike carbon thin film fabrication by plasma-enhanced chemical vapor deposition using CH4/N2 gas mixtures for use as a hard mask |
| 网址 | |
| DOI | |
| 其它 |
期刊:Journal of vacuum science and technology 作者:J. Chong; R. F. Kopf; J.S. Kaufman; Chen Xu; M. Cappuzzo; et al 出版日期:2025-07-30 |
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(2025-6-4)