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Cryogenic etching characteristics of SiO2, SiN, and a-C films with HF/fluorocarbon-containing plasmas
12天前
已完结
Low-temperature etching of silicon oxide and silicon nitride with hydrogen fluoride
12天前
已完结
Titanium nitride and hafnium-zirconium oxide thin film plasma etching for ferroelectric nonvolatile memory applications. I. Etching mechanisms and processes development
12天前
已关闭
Effect of rapid thermal annealing on the mechanical stress and physico-chemical properties in plasma enhanced atomic layer deposited silicon nitride thin films
12天前
已完结
Diamondlike carbon thin film fabrication by plasma-enhanced chemical vapor deposition using CH4/N2 gas mixtures for use as a hard mask
12天前
已完结
Engineering high quality and conformal ultrathin SiNx films by PEALD for downscaled and advanced CMOS nodes
12天前
已完结
Power measurement analysis of moderate pressure capacitively coupled discharges
21天前
已完结
Two-Dimensional Semiconductors for Postsilicon Electronics: From Transistors to Integrated Circuits
2个月前
已完结
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