| 标题 |
Evaluating three dimensionally engineered dry resist film performance for 0.33NA and High-NA EUV patterning |
| 网址 | |
| DOI |
10.1117/12.3089363
doi
|
| 其它 |
期刊:Advances in Patterning Materials and Processes XLIII 作者:Saumya Gulati; Chun-Chia Brown Lu; Phil Friddle; Nizan Kenane; Nayan Chakravarty; et al 出版日期:2026-04-09 |
| 求助人 | |
| 下载 | 该求助完结已超 24 小时,文件已从服务器自动删除,无法下载。 |
PDF的下载单位、IP信息已删除
(2025-6-4)