| 标题 |
 Differentiable forward modeling and inverse lithography for two-photon lithography: application to voxel-by-voxel, diffractive optical element, and spatial light modulator systems |
| 网址 | |
| DOI |
10.1117/1.jmm.25.3.031602
doi
|
| 其它 |
期刊：Journal of Micro/Nanopatterning, Materials, and Metrology 作者：Valeriia Sedova; Yuan Yu; Joël Rovera; Thomas Le Deun; Kevin Heggarty; et al 出版日期：2026-03-10 |
| 求助人 | |
| 下载 | 该求助完结已超 24 小时，文件已从服务器自动删除，无法下载。 |
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(2025-6-4)
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