| 标题 |
[高分]
AN IN SITU X-RAY DIFFRACTION STUDY OF THE GROWTH OF TiNbZrTaHf HIGH-ENTROPY ALLOY THIN FILMS USING SYNCHROTRON RADIATION |
| 网址 | |
| DOI | |
| 其它 |
期刊:High Temperature Material Processes An International Quarterly of High-Technology Plasma Processes 作者:Yurii F. Ivanov; Yurii Kh. Akhmadeev; Nikita A. Prokopenko; Olga V. Krysina; Nikolay N. Koval; et al 出版日期:2025 |
| 求助人 | |
| 下载 | 该求助完结已超 24 小时,文件已从服务器自动删除,无法下载。 |
PDF的下载单位、IP信息已删除
(2025-6-4)