| 标题 |
Progress in the preparation of high-quality wafer-scale monolayer and multilayer MS2 (M = Mo; W) films by CVD |
| 网址 | |
| DOI | |
| 其它 |
期刊:AIP Advances 作者:Yangkun Zhang; Boxin Wang; Dongxia Shi; Guangyu Zhang 出版日期:2023-11-18 |
| 求助人 | |
| 下载 |
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(2025-6-4)