| 标题 |
Effects of Electron Beam Lithography Process Parameters on the Structure of Nanoscale Devices Across Three Substrate Materials |
| 网址 | |
| DOI | |
| 其它 |
期刊:Photonics 作者:Zhong-Yang Liu; Yue Chen; Xuanyu Li; Lu-Wei Wang; J. Qu 出版日期:2025-03-01 |
| 求助人 | |
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(2025-6-4)