| 标题 |
Effect of organic ligand and metal nano-cluster core structure on resist performance of inorganic-organic hybrid resist materials for EUV lithography |
| 网址 | |
| DOI |
10.1117/12.3071800
doi
|
| 其它 |
期刊:International Conference on Extreme Ultraviolet Lithography 2025 作者:H. Yamamoto; K. Okamoto; S. Shimoda; T. Kozawa 出版日期:2025-11-06 |
| 求助人 | |
| 下载 |
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(2025-6-4)