| 标题 |
Profile evolution during polysilicon gate etching with low-pressure high-density Cl2/HBr/O2 plasma chemistries |
| 网址 | |
| DOI | |
| 其它 |
期刊:Journal of Vacuum Science and Technology 作者:M. Tuda; K. Shintani; H. Ootera 出版日期:2001-05-08 |
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(2025-6-4)