| 标题 |
Nanoparticle Photoresists: Ligand Exchange as a New, Sensitive EUV Patterning Mechanism |
| 网址 | |
| DOI | |
| 其它 |
期刊:Journal of Photopolymer Science and Technology 作者:Marie Kryask; Markos Trikeriotis; Christine Ouyang; Sovik Chakrabarty; Emmanuel P. Giannelis; Christopher K. Ober 出版日期:2013 |
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(2025-6-4)