| 标题 |
Patterning with metal-oxide EUV photoresist: patterning capability, resist smoothing, trimming, and selective stripping |
| 网址 | |
| DOI | |
| 其它 |
期刊:Advances in Patterning Materials and Processes XXXIV 作者:Christoph K. Hohle; Roel Gronheid; Ming Mao; Frederic Lazzarino; Peter De Schepper; et al 出版日期:2017 |
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(2025-6-4)