| 标题 |
A Twin-FeFET MLC CIM With Enhanced Voltage and Process Variation Tolerance for Edge Intelligence MAC and AP |
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期刊:IEEE Journal on Emerging and Selected Topics in Circuits and Systems 作者:Zhihao Li; Shuo Yang; Lubin Xiang; Xiaobo Gong; Xiaohang Chen; et al 出版日期:2026-09-01 |
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(2025-6-4)