| 标题 |
专利、报告等 Grain-Orientation-Engineering of Atomic Layer Deposited Ruthenium Interconnect Technology
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| 网址 | |
| DOI |
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| 其它 | 作者：Youngchul Leem, Samsung Advanced Institute of Technology | Eun-Hyoung Cho, Samsung Advanced Institute of Technology | Young Min Lee, Samsung Advanced Institute of Technology | Taewon Jeong, Samsung Advanced Institute of Technology | Yujin Han, Samsung Advanced Institute of Technology | Jae Hong Lee, Samsung Advanced Institute of Technology | Dongmin Kim, Samsung Advanced Institute of Technology | Jeong Yub Lee, Samsung Advanced Institute of Technology | Keun Wook Shin, Samsung Advanced Institute of Technology | Kyung-Eun Byun, Samsung Advanced Institute of Technology | Gi-Young Cho, Samsung Advanced Institute of Technology |
| 求助人 | |
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