| 标题 |
Optimizing EUV imaging metrics as a function of absorber thickness and illumination source: simulation case study of Ta-Co alloy |
| 网址 | |
| DOI | |
| 其它 |
期刊:37th European Mask and Lithography Conference 作者:Devesh Thakare; Annelies Delabie; Vicky Philipsen 出版日期:2022-11-02 |
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(2025-6-4)