| 标题 |
Theoretical Limit of TiSi2 Contact Resistance : *Note: Sub-titles are not captured in Xplore and should not be used |
| 网址 | |
| DOI | |
| 其它 |
期刊:2023 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD) 作者:M. Y. Jeong; M. A. Pourghaderi; K. Vuttivorakulchai; S. Song; Y.-S. Kim; et al 出版日期:2023-09-27 |
| 求助人 | |
| 下载 | 求助已完成,仅限求助人下载。 |
PDF的下载单位、IP信息已删除
(2025-6-4)