| 标题 |
On the origin of enhanced resistive switching behaviors of Ti-doped HfO2 film with nitrogen annealing atmosphere |
| 网址 | |
| DOI | |
| 其它 |
期刊:Surface & Coatings Technology 作者:Hao Zhou; Xiaodi Wei; W. Wei; C. Ye; Rulin Zhang; et al 出版日期:2019-02-15 |
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(2025-6-4)