| 标题 |
Role of H 3 + ions in deposition of silicon thin films from SiH 4 /H 2 discharges: modeling and experiments |
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期刊:Plasma Sources Science and Technology 作者:Tinghui Zhang; Jean-Maxime Orlac’h; Monalisa Ghosh; Vincent Giovangigli; Pere Roca i Cabarrocas; et al 出版日期:2021-07-01 |
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(2025-6-4)