| 标题 |
Self-aligned double patterning for active trim contacts with anisotropic pattern pitches in sub-20 nm dynamic random access memories |
| 网址 | |
| DOI |
10.1117/1.jmm.18.4.040501
doi
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| 其它 |
期刊:Journal of Micro-nanolithography Mems and Moems 作者:Kiseok Lee; Kim Dong-Oh; C. Yoon; Taejin Park; Han Sung-hee; et al 出版日期:2019-12-18 |
| 求助人 | |
| 下载 |
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(2025-6-4)