| 标题 |
[高分]
Effects of Bias Pulsing on Etching of SiO2 Pattern in Capacitively-Coupled Plasmas for Nano-Scale Patterning of Multi-Level Hard Masks |
| 网址 | |
| DOI |
10.1166/jnn.2016.12232
doi
|
| 其它 |
期刊:Journal of Nanoscience and Nanotechnology 作者:Sechan Kim; Gyuhyun Choi; Heeyeop Chae; Nae-Eung Lee 出版日期:2016-05-01 |
| 求助人 | |
| 下载 | 求助已完成,仅限求助人或该文件上传人下载。 |
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(2025-6-4)