| 标题 |
Effects of hydrogen content in films on the etching of LPCVD and PECVD SiN films using CF4/H2 plasma at different substrate temperatures |
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期刊:Plasma Processes and Polymers 作者:Shih‐Nan Hsiao; Nikolay Britun; Thi‐Thuy‐Nga Nguyen; Takayoshi Tsutsumi; Kenji Ishikawa; et al 出版日期:2021-08-04 |
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(2025-6-4)