| 标题 |
High density plasma chemical vapor deposition gap-fill mechanisms |
| 网址 | |
| DOI | |
| 其它 |
期刊:Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena 作者:Hemant P. Mungekar; Young S. Lee 出版日期:2006-04-07 |
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(2025-6-4)