| 标题 |
Enhanced Performance and Gate Bias Stress Stability of Atomic-Layer-Deposited Amorphous Zn–Sn–O Thin-Film Transistors with HfO2 and Al-Doped TiO2 Interlayers on SiO2 Gate Oxide |
| 网址 | |
| DOI | |
| 其它 |
期刊:ACS applied electronic materials 作者:Jinheon Choi; Juneseong Choi; Tae Kyun Kim; Yonghee Lee; Sukin Kang; et al 出版日期:2025-01-02 |
| 求助人 | |
| 下载 | 该求助完结已超 24 小时,文件已从服务器自动删除,无法下载。 |
PDF的下载单位、IP信息已删除
(2025-6-4)