| 标题 |
Chemical-mechanical polishing improvements and subsurface damage elimination for Cz grown (010) β-Ga2O3 substrates |
| 网址 | |
| DOI | |
| 其它 |
期刊:Materials Science in Semiconductor Processing 作者:Robert M. Lavelle; W.J. Everson; Daniel Erdely; Luke A. M. Lyle; Scott W. Pistner; et al 出版日期:2025-01-30 |
| 求助人 | |
| 下载 | 求助已完成,仅限求助人下载。 |
PDF的下载单位、IP信息已删除
(2025-6-4)