| 标题 |
Selective Etching of Native Silicon Oxide in Preference to Silicon Oxide and Silicon |
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期刊:2019 International Symposium on VLSI Technology, Systems and Application (VLSI-TSA) 作者:Christopher Ahles; Jong Choi; Raymond Hung; Namsung Kim; Srinivas Nemani; et al 出版日期:2019-04-01 |
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(2025-6-4)