| 标题 |
Modulating Schottky contact characteristics within Graphene/Janus WGeSiN4 heterostructures: impacts of interlayer spacing and applied electric fields |
| 网址 | |
| DOI | |
| 其它 |
期刊:Materials Science in Semiconductor Processing 作者:Libo Wang; Xinguo Ma; Jiaqi Wang; Hui Lv; Biao Ma; et al 出版日期:2026-11-01 |
| 求助人 | |
| 下载 | 暂无链接,等待应助者上传 |
PDF的下载单位、IP信息已删除
(2025-6-4)