| 标题 |
Multiscale coupled plasma–feature simulation for 3D profile evolution in Si etching under HBr/Cl2 mixture plasmas |
| 网址 | |
| DOI | |
| 其它 |
期刊:Physics of Plasmas 作者:Yeong Geun Yook; Sang Young Chung; Hae Sung You; Jae Hyeong Park; Won Seok Chang; et al 出版日期:2026-08-01 |
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(2025-6-4)